NEW PRODUCT

From digital transformation (DX) and AI to EV adoption and autonomous driving technology, advancements in semiconductors are now indispensable for the progress of society.
And it is high-precision processing technology that underpins these advancements.

As an etching gas, KSG-14 contributes to semiconductor miniaturization as well as enhanced productivity in the semiconductor manufacturing process, thus supporting the evolution of semiconductors.
Exceptional environmental performance and greater productivity help to reduce the consumption of energy, water, and other resources. It also boasts extremely low Global Warming Potential (GWP), thereby playing a role in mitigating climate change.

Etching Performance

KSG-14 has the ability to suppress etching of masking materials during the simultaneous etching of silicon dioxide (SiO2) and silicon nitride (SiN).

Etching Performance(evaluation using blanket wafers in our company)
Gas flow rate Etching Gas/Ar /O2 = 20 / 50 / 0 ~ 50 sccm
Pressure 10 Pa
Plasma power 300 W (single frequency)
Etching time 1 minute

Environmental Performance

Helps Reduce CO2 Emissions

KSG-14 has significantly lower GWP compared to c-C4F8 and it can greatly reduce greenhouse gas emissions derived from process gases released during the semiconductor manufacturing process.

  • *Carbon dioxide equivalent (CO2e) is calculated based on the method stated in Chapter 6: Electronics Industry Emissions issued by the Intergovernmental Panel on Climate Change (IPCC) using the results of our own process exhaust gas analysis.
    **CO2e of c-C4F8 as base of 100

Application to Manufacturing (3D-NAND)

Application to Mass Production of Devices (3D-NAND Memory Channel Hole Etching Process)

KSG-14 has been adopted by KIOXIA Corporation in the memory channel hole etching process for manufacturing 3D-NAND devices. The etching gas has demonstrated improved etch rate, mask selectivity performance, and profile performance.
Details of how KSG-14 is applied to the manufacturing of devices are available on the website of KIOXIA Corporation below.
https://www.kioxia.com/en-jp/rd/technology/topics/topics-62.html