KSG® Concept
KDK Technology
KDK’s Core Technology
Based on our core technologies of electrolysis, fluorination, and particle control, we have developed and established original technologies related to our strengths in chlorination, miniaturization, high purification, organic/inorganic synthesis, coating, polymerization, and more.
KSG®
To respond to technological trends and customer needs in the semiconductor industry, we develop new materials by combining our strengths in chemical synthesis technology and material evaluation technology with materials informatics.
KSG®, which was developed from Kanto Denka Kogyo’s unique technologies, achieves both “low greenhouse effects (low GWPs: global warning potentials)” and “high performance for semiconductor manufacturing processes.”
Sustainability
The gas materials used in semiconductor manufacturing processes generally have a high greenhouse effect (GWP), and with the increase in semiconductor demand, their impact on global warming has been becoming significant. KSG® features low GWPs, minimizing its impact on global warming while also contributing to energy consumption reduction through the increase of efficiency of semiconductor manufacturing.
Great Performance
Seeking for higher performance and lower power consumption, advanced semiconductor devices have been becoming more miniaturized in recent years while their 3D structuring is also sought. This has dramatically increased the difficulty of the semiconductor manufacturing processes and increased the process time.
The KSG® we developed improves the CVD process and the etching process in semiconductor manufacturing, contributing to the miniaturization of advanced semiconductor devices and increased throughput.
Products
KSG®-derived Products
We respond to various customer requests through development, manufacturing, and sales of specialized materials with high performance and low environmental impact in the KSG® series.
- Etching gases (HAR etching, isotropic etching, cryo-etching, low GWP, etc.)
- Cleaning gases (low GWPs)
- Film-forming materials (halides of W, Mo, Nb; organic metal materials)
- Other semiconductors and materials for FPD manufacturing processes