KSG-5

Semiconductors support our convenient lives.
However, it is also true that materials with high environmental impacts are used in their production. How can we protect both daily convenience and the environment?

KSG-5 is an etching gas with a low environmental impact that can support both semiconductor manufacturing and our lives.

Etching Performance

KSG-5 has etching performance equivalent to CF₄ and CHF₃ for silicon-containing films, while also having the ability to suppress etching of mask materials.

Etching performance (evaluated by KDK using blanket wafers)

Gas flow rate	Etching Gas/Ar /O2 = 20 / 50 / 0 ~ 10 sccm
Pressure	10 Pa
Plasma output	300 W (single-frequency)
Etching time	1 min

Environmental Performance

Contribution to CO2 Emissions Reduction

With its overwhelmingly low GWP compared to CF₄ and CHF₃, KSG-5 can significantly reduce greenhouse gases derived from process gases emitted from semiconductor manufacturing processes.